5.1 MOS technology is used to fabricate a capacitor, utilizing the gate metallization and the substrate as the capacitor electrodes. Find the area required per 1-pF capacitance for oxide thickness ranging from 2 nm to 10 nm. For a square plate capacitor of 10 pF, what dimensions are needed?

1 1 - 5.1 MOS technology is used to fabricate a capacitor, utilizing the gate metallization and the substrate as the capacitor electrodes. Find the area required per 1-pF capacitance for oxide thickness ranging from 2 nm to 10 nm. For a square plate capacitor of 10 pF, what dimensions are needed?

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images - 5.1 MOS technology is used to fabricate a capacitor, utilizing the gate metallization and the substrate as the capacitor electrodes. Find the area required per 1-pF capacitance for oxide thickness ranging from 2 nm to 10 nm. For a square plate capacitor of 10 pF, what dimensions are needed?

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